Physical Vapor deposition (PVD)





     Physical Vapor deposition (PVD) is a process used to create a thin layer of a  substance (a coating) on a solid object (the substrate). The substrate is placed into a  vacuum chamber and a small amount  of the coating material is vaporized  into the  chamber. The molecules or atoms of vapor condense onto the substrate, forming  (ideally) a uniform coating of controllable thickness.




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